CH4 OVERVIEW 5 Spindle Chuck The Spindle Chuck uses vacuumto hold the wafer and spin it up to 7000RPM. The speed and time the chuck spins is programmedin Edit mode. 6. Cup exhaust Most processes use exhaustthough the cup to improve uniformity and planarity. This machinehas a 2 inch exhaust line for each cup locatedon the left side of the machine. This exhaust isplumbed through the machine to an exhaust trap, and thento the bottom of the cup. 7. Dispense Arm 2The dispense arm moves over the wafer and and dispenseschemical on the wafer. Normally the arm is positioned todispense in the center of the wafer, because the armis motor driven a radial dispense is possible. The armtravel is programmed in Edit mode. 8. Dispense arm 1The dispense arm moves over the wafer and and dispenseschemical on the wafer. Normally the arm is positioned todispense in the center of the wafer, because the armis motor driven a radial dispense is possible. The armtravel is programmed in Edit mode. 9. Exhaust Vents Thesevents are used to remove chemical and solvent vapors fromthe cup area. 10 Leak Detector This leak detector isused to detect a leak in the cup area. OPERATIONSMANUAL 4-7 REV 01